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真空甩帶爐的使用
發布時間:2019-01-02   瀏覽:2167次

  真空甩帶爐的使用

  真空甩帶爐廠家采用熔(rong)態單輥(gun)旋淬法制備(bei)(bei)非(fei)晶薄帶(dai),及真空噴鑄法制備(bei)(bei)大塊非(fei)晶材料(liao)(liao)。本設備(bei)(bei)也可用于感(gan)應(ying)熔(rong)煉澆鑄各類合金(jin)小試(shi)樣。適(shi)用于大專院校、科研院所及企業進行新材料(liao)(liao)的科研與小批量的生產。

  真(zhen)空甩帶(dai)爐甩帶(dai)功能采用氣缸升降,可(ke)實現(xian)石(shi)英坩(gan)堝到銅(tong)輪的(de)距離微調、自(zi)動下降、延時0.1~5秒自(zi)動噴氣,每(mei)次可(ke)甩5~50g非(fei)晶薄帶(dai)或顆粒;熔煉(lian)澆(jiao)(jiao)注功能:可(ke)一次性熔煉(lian)50~500g金屬,熔煉(lian)好后可(ke)澆(jiao)(jiao)鑄在錠模(mo)內。根據模(mo)具的(de)尺寸,可(ke)以澆(jiao)(jiao)鑄直(zhi)徑10mm~50mm的(de)棒料或其(qi)他規格的(de)成品;可(ke)以澆(jiao)(jiao)鑄金屬錠或者直(zhi)接制備(bei)非(fei)晶金屬棒或其(qi)他異(yi)形產(chan)品。

  真(zhen)空甩帶爐采用直連泵(beng)(beng)加(jia)油(you)擴散泵(beng)(beng)(或者分子(zi)泵(beng)(beng)),用油(you)擴散泵(beng)(beng)真(zhen)空度可達(da)6.67×10-3Pa,用分子(zi)泵(beng)(beng)真(zhen)空度可達(da)6.67×10-4Pa,爐體(ti)全采用不銹鋼(gang),并做拋光處(chu)理。

  真(zhen)空熔煉爐主要由真(zhen)空腔(qiang)體、高頻(pin)加熱(re)系(xi)(xi)統(tong)、真(zhen)空系(xi)(xi)統(tong)、噴鑄(zhu)甩(shuai)帶系(xi)(xi)統(tong)、熔煉澆(jiao)注(zhu)系(xi)(xi)統(tong)、充(chong)放氣系(xi)(xi)統(tong)和控制系(xi)(xi)統(tong)等組成。


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13 May 2019
真空熔煉爐能防止稀有金屬受大氣污染嗎

真空熔煉爐能防止稀有金屬受大氣污染嗎

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